Microlithography 3rd Edition at Meripustak

Microlithography 3rd Edition

Books from same Author: Smith And Bruce W

Books from same Publisher: T&F/Crc Press

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  • General Information  
    Author(s)Smith And Bruce W
    PublisherT&F/Crc Press
    Edition3rd Edition
    ISBN9781032836737
    Pages850
    BindingSoftcover
    LanguageEnglish
    Publish YearJune 2024

    Description

    T&F/Crc Press Microlithography 3rd Edition by Smith And Bruce W

    The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world�€�s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved.New in the Third EditionIn addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography.